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Analysis of Extended Energy-Loss Fine Structure of Nanometerscale Clusters

Published online by Cambridge University Press:  02 July 2020

Y. Ito ,
H. Jain  and
D.B. Williams
Y. Ito
Affiliation:
Department of Materials Science and Engineering, Lehigh University, 5 East Packer Ave., Bethlehem, PA18015, USA
H. Jain
Affiliation:
Department of Materials Science and Engineering, Lehigh University, 5 East Packer Ave., Bethlehem, PA18015, USA
D.B. Williams
Affiliation:
Department of Materials Science and Engineering, Lehigh University, 5 East Packer Ave., Bethlehem, PA18015, USA
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Small atomic clusters are of great importance for applications such as catalysts whose activity depends on the surface of the cluster. Attempts to determine the atomic short-range order and size of clusters have been made by analyzing the extended X-ray absorption fine structure (EXAFS). However, the analysis was made on an average of many small clusters. Analysis of extended energy-loss fine structure (EXELFS) in an electron energy-loss spectrum (EELS) has developed to the point where in some cases, the quality of the results is comparable to its X-ray analogue, EXAFS. No other technique provides nanometer-scale spatial resolution of the analyzed area for determining the atomic structure. Most EXELFS analysis has been performed on the K-ionization edge of lighter elements. For heavier elements, a more complex ionization edge such as the L-edge has to be used, due to the inefficiency of collecting high quality EEL spectra at higher energy-losses (Z > 18).

Type
A. Howie Symposium: Celebration of Pioneering Electron Microscopy
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 708 - 709
Copyright
Copyright © Microscopy Society of America

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References

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5. This work is supported by the US Department of Energy (DE-FG02-95ER45540). The magnetronsputtering machine is supported by NSF (DMR-941116).Google Scholar