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Advancements in Plasma-Based Decontamination Equipment and Related Metrology

Published online by Cambridge University Press:  05 August 2019

CA Moore  and
GJ Collins
CA Moore*
Affiliation:
Vacuum Sciences, Dana Point, CA, USA.
GJ Collins
Affiliation:
Colorado State University, Electrical and Computer Engineering, Fort Collins, CO, USA.
*
*Corresponding author: [email protected]

Abstract

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Type
Vendor Symposium
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 542 - 543
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Steinbruchel, C in “Plasma Sources for Thin Film Deposition and Etching”, ed. Francombe, M. and Vossen, J., (Academic Press, New York).Google Scholar
[2]Moore, C et al. , International Workshop on EUVL (2013).Google Scholar