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Advancements in Decontamination of Vacuum Systems Using Plasma Cleaning

Published online by Cambridge University Press:  27 August 2014

Ronald Vane  and
C. A. Moore
Ronald Vane
Affiliation:
XEI Scientific, Redwood City, CA, USA
C. A. Moore
Affiliation:
XEI Scientific, Redwood City, CA, USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 1130 - 1131
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Vladár, András E., Postek, Michael T. and Vane, Ronald, “Active Monitoring and Control of Electron Beam Induced Contamination”, Proc. SPIE Vol. 4344 (2001), 835.Google Scholar
[2] Kosmowska, Ε., Varley, D. & Vane, R., and Moore, C. SPIE Conference on Lithography (2013).Google Scholar