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Article contents
Surface chemistry of Al(CH3)3 and TiCl4 on GaAs(100) and InGaAs during the first half-cycle of atomic layer deposition
Published online by Cambridge University Press: 23 November 2012
Abstract
Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.
- Type
- Research Article
- Information
- Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 906 - 907
- Copyright
- Copyright © Microscopy Society of America 2012