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STEM and STEM EELS Characterization of Low Defect Density, Smooth Fe3O4 Thin Films on Buffered Si by Kinetically Controlled Selective Oxidation

Published online by Cambridge University Press:  23 November 2012

F. Shi ,
H. Xiang ,
Y. Chang ,
P.M. Voyles  and
M.S. Rzchowski
F. Shi
Affiliation:
Department of Materials Science and Engineering,University of Wisconsin-Madison, Madison, WI
H. Xiang
Affiliation:
Department of Materials Science and Engineering,University of Wisconsin-Madison, Madison, WI
Y. Chang
Affiliation:
Department of Materials Science and Engineering,University of Wisconsin-Madison, Madison, WI
P.M. Voyles
Affiliation:
Department of Materials Science and Engineering,University of Wisconsin-Madison, Madison, WI
M.S. Rzchowski
Affiliation:
Department of Physics, University of Wisconsin-Madison, Madison, WI
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Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 322 - 323
Copyright
Copyright © Microscopy Society of America 2012

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