Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-09T09:21:47.345Z Has data issue: false hasContentIssue false

Solid-Phase Epitaxial Regrowth of GaAs by in-situ Controlled Intermediate Phase Decomposition

Published online by Cambridge University Press:  02 July 2020

J.K. Farrer
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue South East, Minneapolis, MN55455
D.A. Caldwell
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue South East, Minneapolis, MN55455
C.J. Palmstrom
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue South East, Minneapolis, MN55455
C.B. Carter
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue South East, Minneapolis, MN55455
Get access

Extract

A transmission electron microscopy (TEM) analysis on the regrowth of GaAs by a two-stage reaction between a metal layer (M) and a GaAs substrate is presented. The first stage of the regrowth process is the consumption of GaAs in a low temperature reaction with the metal layer, producing an intermediate phase of (MxGaAs). A second solid-phase reaction, induced by the deposition of Ga or As, results in the decomposition of the intermediate phase and the epitaxial regrowth of a layer of GaAs. The sample growth and reactions were performed in-situ in a molecular beam epitaxy system, using Ni for the metal and As deposition for the second reaction. TEM data confirm the formation of the ternary phase, NixGaAs, and its subsequent decomposition into NiAs and GaAs by reacting with the deposited As. A layer of AlGaAs, 100 nm thick, was grown in all samples as a marker.

Type
Microscopy of Semiconducting and Superconducting Materials
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Chen, S.H. et al, Appl. Phys. Lett. 48 (1986) 803.CrossRefGoogle Scholar

2. Sands, T. et al, Appl. Phys. Lett. 48 (1986) 402.CrossRefGoogle Scholar

3. Chen, S.H. et al, J. Mater. Res. 3 (1988) 1385.CrossRefGoogle Scholar

4. Sands, T. et al, J. Mater. Res. 3 (1988) 914.CrossRefGoogle Scholar

6. This work is supported by AFOSR under Grant No. AF/F49620-95-1-0360.Google Scholar