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Self-Assembled Nanostructures on VSe2 Surfaces Induced by Cu Deposition

Published online by Cambridge University Press:  28 September 2005

Erdmann Spiecker ,
Stefan Hollensteiner ,
Wolfgang Jäger ,
Hans Haselier  and
Herbert Schroeder
Erdmann Spiecker
Affiliation:
Center for Microanalysis, Faculty of Engineering, University of Kiel, Kaiserstrasse 2, D-24143 Kiel, Germany
Stefan Hollensteiner
Affiliation:
Center for Microanalysis, Faculty of Engineering, University of Kiel, Kaiserstrasse 2, D-24143 Kiel, Germany
Wolfgang Jäger
Affiliation:
Center for Microanalysis, Faculty of Engineering, University of Kiel, Kaiserstrasse 2, D-24143 Kiel, Germany
Hans Haselier
Affiliation:
Institute for Solid State Research, Research Center Jülich, D-52425 Jülich, Germany
Herbert Schroeder
Affiliation:
Institute for Solid State Research, Research Center Jülich, D-52425 Jülich, Germany
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Abstract

Analytical transmission electron microscopy (TEM) and scanning electron microscopy (SEM) have been applied for the characterization of evolution, lateral arrangements, orientations, and the microscopic nature of nanostructures formed during the early stages of ultrahigh vacuum electron beam evaporation of Cu onto surfaces of VSe2 layered crystals. Linear nanostructure of relatively large lateral dimension (100–500 nm) and networks of smaller nanostructures (lateral dimension: 15–30 nm; mesh sizes: 500–2000 nm) are subsequently formed on the substrate surfaces. Both types of nanostructures are not Cu nanowires but are composed of two strands of crystalline substrate material elevating above the substrate surface. For the large nanostructures a symmetric roof structure with an inclination angle of ∼30° with respect to the substrate surface could be deduced from detailed diffraction contrast experiments. In addition to the nanostructure networks a thin layer of a Cu-VSe2 intercalation phase of 3R polytype is observed at the substrate surface. A dense network of interface dislocations indicates that the phase formation is accompanied by in-plane strain. We present a model that explains the formation of large and small nanostructures as consequences of compressive layer strains that are relaxed by the formation of rooflike nanostructures, finally evolving into the observed networks with increasing deposition time. The dominating contributions to the compressive layer strains are considered to be an electronic charge transfer from the Cu adsorbate to the substrate and the formation of a Cu-VSe2 intercalation compound in a thin surface layer.

Keywords

self-assembling nanostructuresnanowireslayered chalcogenidesintercalationtransmission electron microscopystrain relaxation
Type
Special Issue: Frontiers of Electron Microscopy in Materials Science
Information
Microscopy and Microanalysis , Volume 11 , Issue 5 , October 2005 , pp. 456 - 471
Copyright
© 2005 Microscopy Society of America

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References

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