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Selected Reflection Imaging of Nanostructured Materials

Published online by Cambridge University Press:  02 July 2020

Yi Liu  and
David J. Sellmyer
Yi Liu
Affiliation:
Center for Materials Research and Analysis, and Department of Mechanical Engineering, Lincoln, NE, 68588.
David J. Sellmyer
Affiliation:
Center for Materials Research and Analysis, and Behlen Laboratory of Physics, University of Nebraska, Lincoln, NE, 68588.
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Extract

Nanostructured materials are finding increasing applications. In characterizing the nanostructured materials, we have developed a technique using a conventional TEM to characterize the nanostructure. The technique is named selected reflection imaging and could be used for measuring the grain size, measuring the volume fraction of a second phase in a dual phase material, measuring the texture and identifying the crystal structure in multiphase materials.

The technique is evolved from dark field imaging which is known to generate strong contrast. In conventional materials with a grain size larger than 1 μm, selected area diffraction pattern is from a single crystal. Dark field image could be formed by allowing one of the diffracted beam to go through the objective aperture. In nanostructured materials, however, the diffraction pattern becomes a ring pattern. Ordinary dark field image could be formed by allowing one of the spot in the ring to go through the aperture. However, only a limited number of grains are differentiated from the rest.

Type
Nanophase and Amorphous Materials
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 752 - 753
Copyright
Copyright © Microscopy Society of America

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References

This research is sponsored by the Department of Energy, Grant Number DE-FG-02-86ER45262, National Science Foundation, Grant Number DMR-9623992, National Storage Industry Consortium and CMRA.