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Real-time Observation of Aluminum Chemical Vapor Deposition in an Environmental Scanning Electron Microscope

Published online by Cambridge University Press:  28 July 2005

David L. Linam  and
Jeff Drucker
David L. Linam
Affiliation:
Department of Electrical and Computer Engineering, The University of Texas at El Paso, El Paso, TX 79968
Jeff Drucker
Affiliation:
Physics Department, The University of Texas at El Paso, El Paso, TX 79968
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Abstract

A technique has been developed to provide real-time imaging, with several nanometer resolution, of organometallic chemical vapor deposition (CVD) by scanning electron microscopy under conditions approaching those used in the microelectronics industry. The technique involves modifications to an environmental scanning electron microscope (ESEM) to facilitate organometallic precursor gas handling and sample heating. To demonstrate the usefulness of this technique for studying the microstructural evolution of CVD-grown metal films, results of Al/SiO2 CVD experiments are presented.

Keywords

real timechemical vapor depositionaluminum chemical vapor depositionenvironmental scanning electron microscopetri-isobutyl aluminummicrostructural evolution
Type
Research Article
Information
Microscopy and Microanalysis , Volume 4 , Issue 5 , October 1998 , pp. 497 - 503
Copyright
© 2005 Microscopy Society of America

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