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Quantitative Thickness Mapping of Dewetting Polymer Bilayers

Published online by Cambridge University Press:  02 July 2020

D. A. Winesett ,
H. Ade ,
A. P. Smith ,
M. Rafailovich ,
S. Sokolov  and
D. Slep
D. A. Winesett
Affiliation:
Dept. of Physics, North Carolina State University, Raleigh, NC27695-8202
H. Ade
Affiliation:
Dept. of Physics, North Carolina State University, Raleigh, NC27695-8202
A. P. Smith
Affiliation:
Dept. of Physics, North Carolina State University, Raleigh, NC27695-8202
M. Rafailovich
Affiliation:
Dept. Materials Science and Engineering, SUNY@Stony Brook, Stony Brook, NY11794
S. Sokolov
Affiliation:
Dept. Materials Science and Engineering, SUNY@Stony Brook, Stony Brook, NY11794
D. Slep
Affiliation:
Advanced Development and Research, Hilord Chemical Corp., Hauppauge, NY11788
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Extract

The study of wetting and dewetting in thin polymer films has many implications for technological applications of polymer films, including dielectric films to control conductivity and colloidal paint systems. We have started to use a novel approach, Near Edge X-ray Absorption Fine Structure (NEXAFS) microscopy, to characterize dewetting in thin polymer films. We have investigated a polystyrene/brominated polystyrene (PS/PBrS) bilayer model system with the Scanning Transmission X-ray Microscope (STXM) at the National Synchrotron Light Source. Our method offers quantitative thickness mapping of all constituent components in these thin polymer films.

NEXAFS imaging of polymers has advantages over other forms of microscopy primarily because of its low damage, good chemical sensitivity, and the possibility for quantitative analysis. Figure 1 shows four micrographs of one PS/PBrS bilayer annealed for one week at 170 C.

Type
Developments in Measuring Polymer Microstructures
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 828 - 829
Copyright
Copyright © Microscopy Society of America

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References

1.Rightor, E. G., et al., J. Phys. Chem B 101 (1997) 1950.CrossRefGoogle Scholar
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4. The authors would like to thank J. Kirz and C. Jacobsen for construction and maintenance of the Beamline XIA STXM at the National Synchrotron Light Source (NSLS) with support from the Office of Biological and Environmental Research, DOE contract DE-FG02-89ER60858.Google Scholar