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Observation of an Elementary Cuboctahedron Of Xe Nanocrystal in an Al Matrix

Published online by Cambridge University Press:  02 July 2020

Charles W. Allen
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL60439, USA
Robert C. Birtcher
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL60439, USA
Kazuo Furuyat
Affiliation:
National Research Institute for Metals, Tsukuba, Ibaraki, 305-0003, JAPAN
M Songt
Affiliation:
National Research Institute for Metals, Tsukuba, Ibaraki, 305-0003, JAPAN
Steven E. Donnelly
Affiliation:
University of Salford, Manchester, M5 4WT, UK
Edward A. Ryan
Affiliation:
Materials Science Division, Argonne National Laboratory, Argonne, IL60439, USA
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Extract

When a noble gas element such as Xe is implanted in an fee metal matrix such as Al at room temperature, a fine dispersion of precipitates forms. The precipitates are elementary fee crystals up to diameters of several nanometers (for Xe in Al, 8-10 nm), above which they are non-crystalline. The precipitates exhibit a cube-on-cube orientation relation with the matrices and have lattice parameters which are much larger than those of the matrices (axe ≃ 1-5aAl). Thus the interphase interfaces are incommemsurate though the lattices are isotactic. The precipitates assume the shape of matrix cavities; for an Al matrix, at equilibrium this is a cuboctahedron, a {111} octahedron truncated at the corners on {100}. Fig. 1 is a sketch of a dispersion of such cuboctahedra, viewed approximately along a <110>.

For this study specimens were prepared in the HVEM-Tandem Facility at Argonne National Laboratory by implanting 35 keV Xe to a dose of 4x1019 m−2 into well-annealed 5N Al discs which had been thinned by jet electropolishing.

Type
Irradiation and Implantation Effects in Materials
Copyright
Copyright © Microscopy Society of America

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References

1. Research jointly supported by U. S. Department of Energy, BES-Materials Sciences, under Contract W-31-109-Eng-38 and the Science and Technology Agency of Japan.Google Scholar
2.Allen, C.W.et al., J. of Electron Micros. (1999) In Review.Google Scholar
3.Furuya, K.et al., J. of Micros (1999) In Press.Google Scholar