Hostname: page-component-586b7cd67f-tf8b9 Total loading time: 0 Render date: 2024-11-27T01:45:32.535Z Has data issue: false hasContentIssue false

New Transmission Electron Microscope Characterization Techniques from Precision Focused Ion Beam Membranes

Published online by Cambridge University Press:  02 July 2020

R. Hull
Affiliation:
Department of Materials Science and Eng., University of Virginia, Charlottesville, VA22903-2442
D. Dunn
Affiliation:
Department of Materials Science and Eng., University of Virginia, Charlottesville, VA22903-2442
J. Demarest
Affiliation:
Department of Materials Science and Eng., University of Virginia, Charlottesville, VA22903-2442
D.T. Mathes
Affiliation:
Department of Materials Science and Eng., University of Virginia, Charlottesville, VA22903-2442
Get access

Extract

The combination of focused ion beam (FIB) sputtering with transmission electron microscopy (TEM) offers new opportunities for the nanoscale characterization of materials. The FIB may be used to prepare membranes for TEM imaging which are: (i) Site selective, i.e. the membranes may be placed with sub-micron precision in all three dimensions, (ii) Largely free of differential sputtering artifacts, such that membranes may be prepared which are of constant thickness from structures with very dissimilar materials, and (iii) Of precisely known geometry.

The challenges associated with FIB specimen preparation will also be discussed and are summarized in Figure 1: (a) Surface amorphization damage, (b) Residual differential sputtering effects, (c) Redeposition of sputtered material and (d) Membrane bowing due to internal or beaminduced stresses. It will be demonstrated that each of these effects can be sufficiently controlled to allow high quality diffraction contrast imaging in a wide range of materials.

Type
Precision Specimen Preparation
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

(1)Hull, R.et al., Appl. Phys. Lett. 66 (1995) 341CrossRefGoogle Scholar
(2)Janssens, K.G.F.et al., Appl. Phys. Lett. 67 (1995) 1530CrossRefGoogle Scholar
(3)Dunn, D. and Hull, R., submitted to Applied Physics Letters (1999)Google Scholar