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Nanolithography on Graphene by Using Scanning Tunneling Microscopy in a Methanol Environment

Published online by Cambridge University Press:  10 September 2013

Chulsu Kim ,
Joonkyu Park ,
Yongho Seo ,
Jinho Ahn  and
In-Sung Park
Chulsu Kim
Affiliation:
Faculty of Nanotechnology and Advanced Material Engineering, GRI, & HMC, Sejong University, Seoul 143-747, SouthKorea
Joonkyu Park
Affiliation:
Faculty of Nanotechnology and Advanced Material Engineering, GRI, & HMC, Sejong University, Seoul 143-747, SouthKorea
Yongho Seo*
Affiliation:
Faculty of Nanotechnology and Advanced Material Engineering, GRI, & HMC, Sejong University, Seoul 143-747, SouthKorea
Jinho Ahn
Affiliation:
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, SouthKorea
In-Sung Park*
Affiliation:
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, SouthKorea
*
*Corresponding author. E-mail: [email protected]
**Corresponding author. E-mail: [email protected]
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Abstract

Since it was discovered in 2004, graphene has attracted enormous attention as an emerging material for future devices, but it has been found that conventional lithographic processes based on polymer resist degrade its intrinsic performance. Recently, our group studied a resist-free scanning tunneling microscopy-based lithography in various atmospheres by injecting volatile liquids into a chamber. In this study, multilayer graphene was scanned and etched by controlling bias voltage under methanol pressure. We focused on improving patterning results in terms of depth and line width, while the previous study was performed to find an optimum gas environment for patterning on a graphite surface. Specifically, we report patterning outputs depending on conditions of voltage, current, and pressure. The optimum conditions for methanol environment etching were a gas pressure in the range of 41–50 torr, a −4 V tip bias, and a 2 nA tunneling current.

Keywords

graphenenanolithographySTMmethanolSPL
Type
Materials Applications
Information
Microscopy and Microanalysis , Volume 19 , Issue 6 , December 2013 , pp. 1569 - 1574
Copyright
Copyright © Microscopy Society of America 2013 

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