No CrossRef data available.
Article contents
Microhotplate Chemical Vapor Deposition and in the Environmental SEM Chamber
Published online by Cambridge University Press: 02 July 2020
Extract
Metal oxide films are are an emerging sensing technology for the identification of gas phase species. Metalorganic chemical vapor deposition (MOCVD) on microhotplate structures provides a method of fabricating gas sensing layers in self-patterned structures. Investigation of the morphological characteristics of film growth is normally not possible inside a MOCVD reactor, especially the nucleation phase and subsequent deposition of a continuous film. The environmental scanning electron microscope (ESEM) operates at a pressure range of 133-666 Pa (1-5 Torr) which is similar to the growth condition normally used for oxide film MOCVD on microhotplates. Our results show that microhotplate MOCVD can be monitored in situby secondary electron and backscattered electron imaging in the ESEM.
The microhotplate chemical sensor devices employed in this work are mounted in conventional 40 pin packages which provide separate electrical connections to each of the four micromachined heater and contact structures.
- Type
- In Situ Studies in Microscopy
- Information
- Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 603 - 604
- Copyright
- Copyright © Microscopy Society of America 1997