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Measurement of the ratio of substitutional to interstitial dopant-incorporation in nanostructures

Published online by Cambridge University Press:  07 September 2007

T Niermann ,
D Mai ,
J Zenneck ,
M Roever ,
J Malindretos ,
A Rizzi  and
M Seibt
T Niermann
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
D Mai
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
J Zenneck
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
M Roever
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
J Malindretos
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
A Rizzi
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
M Seibt
Affiliation:
Georg-August-Universität Göttingen,Germany and Virtual Institute of Spin Electronics (VISel)
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Extract

Extended abstract of a paper presented at MC 2007, 33rd DGE Conference in Saarbrücken, Germany, September 2 – September 7, 2007

Type
Research Article
Information
Microscopy and Microanalysis , Volume 13 , Issue S03 , September 2007 , pp. 428 - 429
Copyright
Copyright © Microscopy Society of America 2007

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