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Large area patterning using ion-beam lithography

Published online by Cambridge University Press:  03 August 2008

LE Ocala  and
A Imre
LE Ocala
Affiliation:
Argonne National Laboratory
A Imre
Affiliation:
Argonne National Laboratory
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 986 - 987
Copyright
© 2008 Microscopy Society of America

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