Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-19T02:02:32.584Z Has data issue: false hasContentIssue false
  • English
  • Français

Diffusion of TaN and HfO into TiN in a Metal Gate Stack

Published online by Cambridge University Press:  03 August 2008

D Reinhard ,
D Lawrence ,
D Olson  and
R Alvis
D Reinhard
Affiliation:
Imago Scientific Instruments
D Lawrence
Affiliation:
Imago Scientific Instruments
D Olson
Affiliation:
Imago Scientific Instruments
R Alvis
Affiliation:
Imago Scientific Instruments
Get access

Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 1252 - 1253
Copyright
© 2008 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)