Hostname: page-component-586b7cd67f-t7fkt Total loading time: 0 Render date: 2024-11-26T19:47:28.275Z Has data issue: false hasContentIssue false
  • English
  • Français

Development of a 1MV-Field-Emission Electron Microscope I. Instrument

Published online by Cambridge University Press:  02 July 2020

I. Matsui ,
T. Katsuta ,
T. Kawasaki ,
S. Hayashi ,
T. Furutsu ,
T. Onai ,
K. Myochin ,
T. Yoshida ,
T. Matsuda  and
S. Kubota
...Show all authors
I. Matsui
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan CREST, Japan Science and Technology Corporation (JST)
T. Katsuta
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan
T. Kawasaki
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan CREST, Japan Science and Technology Corporation (JST)
S. Hayashi
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan
T. Furutsu
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan
T. Onai
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan
K. Myochin
Affiliation:
Instruments, Hitachi, Ltd., 882 Ichige, Hitachi-naka, 312-0033, Japan
T. Yoshida
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan CREST, Japan Science and Technology Corporation (JST)
T. Matsuda
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan CREST, Japan Science and Technology Corporation (JST)
S. Kubota
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan
J. Endo
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan
N. Osakabe
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan CREST, Japan Science and Technology Corporation (JST)
A. Tonomura
Affiliation:
Advanced Research Laboratory, Hitachi, Ltd., Hatoyama, Saitama350-0395, Japan CREST, Japan Science and Technology Corporation (JST)
K . Kitazawa
Affiliation:
Department of Applied Chemistry, University of Tokyo, Tokyo, 113-8656, Japan CREST, Japan Science and Technology Corporation (JST)
Get access

Extract

We have developed 100-kV, 200-kV, and 350-kV cold-field-emission transmission electron microscopes (FE-TEMs) successively up to this time. Using these instruments, we have been studying the magnetic structure of materials, high-resolution imaging by electron holography, and dynamic observation of the vortex in superconductors by Lorentz microscopy. To make more progress in our research, we need a better electron beam in terms of coherency, beam brightness, and penetration. Here, we report a new lMV-cold-field-emission transmission electron microscope we have developed. Historically, the pioneering projects on a lMV-field-emission scanning transmission electron microscope (FE-STEM) (Zeitler and Crewe, 1974) and a 1.6MV FE-STEM (Jouffrey et al., 1984) have been reported. In 1988, Maruse and Shimoyama obtained a lMV-field-emission beam using their 1.25MV-STEM connected to a field-emission gun. Since then, continuous improvements in beam brightness has been made.

The target specifications of our 1 MV-cold-field-emission TEM (H-1000FT) are as follows: Acceleration voltage: 1MV, high-voltage stability :

Type
Instrument Performance
Information
Microscopy and Microanalysis , Volume 6 , Issue S2: Proceedings: Microscopy & Microanalysis 2000, Microscopy Society of America 58th Annual Meeting, Microbeam Analysis Society 34th Annual Meeting, Microscopical Society of Canada/Societe de Microscopie de Canada 27th Annual Meeting, Philadelphia, Pennsylvania August 13-17, 2000 , August 2000 , pp. 1138 - 1139
Copyright
Copyright © Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

References:

1.Kawasaki, T. et al., Microbeam Analysis 3 (1994)287.Google Scholar
2.Tonomura, A., Electron Holography, 2nd ed., Springer, Heidelberg, (1999).CrossRefGoogle Scholar
3.Zeitler, E. and Crewe, A.V., Proc. 8th Int. Congr. on Electron Microscopy, Canberra (1974)Vol.1,40.Google Scholar
4.Garg, R.K. et al., Proc. 3rd Asia-Pacific Conf. on Electron Microscopy, Singapore(1984)100.Google Scholar
5.Maruse, S. and Shimoyama, H., Proc. 4th Asia-Pacific Conf. on Electron Microscopy, Bangkok (1988) 207.Google Scholar
6.Morita, C. et al., Proc. 14th Int. Conf. on Electron Microscopy, Cancun (1998)Vol. 1, 285.Google Scholar