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Defect Review at 0.25 Micron Electron Optic Requirements and Practical Examples
Published online by Cambridge University Press: 02 July 2020
Extract
The sub-micron era in 1C process technology has been characterized by ever shrinking device geometries. When the minimum feature size of 0.5 micron was reached, a significant inflection in the usefulness of optical microscopy occurred. Seemingly routine Fab activities such as the use of the optical microscopes to determine the quality of the metal etch were no longer possible. At the same time, an increased use of defect inspection tools such as KLA and Tencor was required to insure stable process quality. These and other factors combined to hasten the introduction of multiple defect review scanning electron microscopes into the modern 1C Fab. This trend has accelerated during the process development of 0.25 micron technology. Accordingly, as leading 1C manufactures introduce production 0.25 devices, it is not unusual to find as many as six such instruments installed in a modern development or fabrication facility. As such, these instruments, commonly called Defect Review Tools (DRT's) constitute an increasing share of the Fab equipment set.
- Type
- Recent Developments In Microscopy For Studying Electronic and Magnetic Materials
- Information
- Microscopy and Microanalysis , Volume 3 , Issue S2: Proceedings: Microscopy & Microanalysis '97, Microscopy Society of America 55th Annual Meeting, Microbeam Analysis Society 31st Annual Meeting, Histochemical Society 48th Annual Meeting, Cleveland, Ohio, August 10-14, 1997 , August 1997 , pp. 447 - 448
- Copyright
- Copyright © Microscopy Society of America 1997