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Influence of Deposition Parameters on the Composition and Structure of Reactively Sputtered Nanocomposite TaC/a-C:H Thin Films

Published online by Cambridge University Press:  03 March 2011

Ryan D. Evans ,
Jane Y. Howe ,
James Bentley ,
Gary L. Doll  and
Jeffrey T. Glass
Ryan D. Evans*
Affiliation:
The Timken Company, Canton, Ohio 44706; and Case Western Reserve University, Cleveland, Ohio 44106
Jane Y. Howe
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
James Bentley
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
Gary L. Doll
Affiliation:
The Timken Company, Canton, Ohio 44706
Jeffrey T. Glass
Affiliation:
Duke University, Durham, North Carolina 27708
*
a) Address all correspondence to this author. e-mail: [email protected]
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Abstract

The properties of nanocomposite tantalum carbide/amorphous hydrocarbon (TaC/a-C:H) thin films depend closely on reactive magnetron sputtering deposition process conditions. The chemical composition and structure trends for TaC/a-C:H films were obtained as a function of three deposition parameters: acetylene flow rate, applied direct current (dc) bias voltage, and substrate carousel rotation rate. Films were deposited according to a 23 factorial experimental design to enable multiple linear regression modeling of property trends. The Ta/C atomic ratio, hydrogen content, total film thickness, TaC crystallite size, and Raman spectra were statistically dependent on acetylene flow rate, applied dc bias voltage, or both. Transmission electron microscopy revealed a nanometer-scale lamellar film structure, the periodicity of which was affected mostly by substrate carousel rotation rate. The empirical property trends were interpreted with respect to hypothesized growth mechanisms that incorporate elements of physical vapor deposition and plasma-enhanced chemical vapor deposition.

Keywords

CompositePhysical vapor deposition (PVD)Plasma-enhanced CVD (PECVD)
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 9 , September 2005 , pp. 2583 - 2596
Copyright
Copyright © Materials Research Society 2005

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