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Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

Published online by Cambridge University Press:  31 January 2011

Byung-Hyuk Jun ,
Joon Sung Lee ,
Dae-Weon Kim ,
Tae-Hyun Sung ,
Byeong-Soo Bae  and
Kwangsoo No
Byung-Hyuk Jun
Affiliation:
Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea
Joon Sung Lee
Affiliation:
Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea
Dae-Weon Kim
Affiliation:
Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea
Tae-Hyun Sung
Affiliation:
Center for Advanced Studies in Energy and Environment, Korea Electric Power Research Institute, Munji-Dong, Yusung-Gu, Taejon, 305-380, Korea
Byeong-Soo Bae
Affiliation:
Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea
Kwangsoo No
Affiliation:
Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology, Kusung-Dong, Yusung-Gu, Taejon, 305-701, Korea
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Abstract

Amorphous fluorinated silicon nitride films have been deposited with the variation of NF3 flow rate using SiH4, N2, Ar, and NF3 gases by inductively coupled plasma enhanced chemical vapor deposition for the first time, and the absolute composition, oxidation mechanism, and optical properties were investigated. The absolute composition including hydrogen was performed by means of elastic recoil detection time of flight. It was found that the oxygen and fluorine contents in the film dramatically increased, but the hydrogen content decreased to below 4 at.% as the NF3 flow rate increased. The oxidation mechanism could be explained in terms of the incorporation of the activated residual oxygen species in the chamber into the film with unstable open structure by the fluorine-added plasma. It was shown that the density and optical properties such as refractive index, absorption coefficient, and optical energy gap depended on the film composition. The variations of the above properties for fluorinated silicon nitride film could be interpreted by the contents of fluorine and oxygen with high electronegativity.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 3 , March 1999 , pp. 995 - 1001
Copyright
Copyright © Materials Research Society 1999

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References

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