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Synthesis of metal oxide thin films by liquid-phase deposition method

Published online by Cambridge University Press:  31 January 2011

Shigehito Deki  and
Yoshifumi Aoi
Shigehito Deki
Affiliation:
Department of Chemical Science & Engineering, Faculty of Engineering, Kobe University, Rokkodai-cho, Nada-ku, Kobe 657, Japan
Yoshifumi Aoi
Affiliation:
Department of Materials Chemistry, Faculty of Science and Technology, Ryukoku University, Seta, Otsu 520–21, Japan
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Abstract

A novel wet process to synthesize metal oxide thin films has been developed. The process is called the Liquid-Phase Deposition (LPD) method. In this method, metal oxide or hydroxide thin films are formed on the substrate through the ligand-exchanging (hydrolysis) equilibrium reaction of metal-fluoro complex species and the F− consumption reaction of a F− scavenger. The LPD method is a unique soft solution process, and is performed by very simple procedures. In this paper, we develop a method of preparing composite oxide thin films, Pt-dispersed titanium oxide, and iron-nickel binary oxide thin films.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 4 , April 1998 , pp. 883 - 890
Copyright
Copyright © Materials Research Society 1998

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