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Improved crystallinity and optical properties of AlOx thin films by a ZnO interlayer

Published online by Cambridge University Press:  06 January 2012

Su-Shia Lin
Affiliation:
Department of Material Science and Engineering, National Cheng-Kung University, Tainan, Taiwan 701, Republic of China
Jow-Lay Huang
Affiliation:
Department of Material Science and Engineering, National Cheng-Kung University, Tainan, Taiwan 701, Republic of China
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Abstract

To ascertain how the substrate influences the quality of AlOx films, AlOx films were grown on a bare glass and a ZnO-deposited glass in this study. By applying a ZnO interlayer before the AlOx deposition, AlOx films exhibited polycrystalline structure rather than amorphous as obtained by sputtering on a bare glass. For AlOx film on the ZnO-deposited glass, the transmission electron microscopy observation showed the coexistence of amorphous and polycrystalline structure, which reveals that the (122) plane in AlOx film is parallel to the surface of the substrate. The grains of the AlOx film grown on a ZnO-deposited glass comprising many small crystallites aggregated with sizes varying between 38 and 54 nm with irregular grain shapes. Besides, the ZnO interlayer with different deposition parameters had a significant effect in the diffusion interface between AlOx and ZnO. The ZnO interlayer could improve the optical transmission of AlOx films, especially when ZnO films are prepared with a high power of 200 W. Therefore, the glass/ZnO may be a good alternative substrate for producing high-quality AlOx films by controlling the epitaxial grain growth. The AlOx films grown on ZnO-deposited glasses have very good qualities in terms of crystallinity and optical properties.

Type
Articles
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

Wefers, K. and Misra, C., Oxides and Hydroxides of Aluminum, Alcoa Technical Paper No. 19 (Alcoa Laboratories, Pittsburgh, PA, 1987).Google Scholar
Schneider, J.M., Sproul, W.D., Chia, R.W.J., Wong, M-S., Matthews, A., Surf. Coat. Technol. 96, 262 (1997).CrossRefGoogle Scholar
Gornachev, B., Orlinov, V., and Popova, V., Thin Solid Films 33, 173 (1976).CrossRefGoogle Scholar
Schiller, S., Goedicke, K., Reschke, J., Kirchhoff, V., Schneider, S., and Milde, F., Surf. Coat. Technol. 61, 331 (1993).CrossRefGoogle Scholar
Clarke, P.J., J. Vac. Sci. Technol. A 12, 594 (1994).CrossRefGoogle Scholar
Cueff, R., Baud, B., Besse, J.P., and Jaquette, M., Thin Solid Films 266, 198 (1995).CrossRefGoogle Scholar
Ohring, M., The Materials Science of Thin Films (Academic Press, San Diego, CA, 1991), p. 519.Google Scholar
Fietzke, F., Goedicke, K., and Hempel, W., Surf. Coat. Technol. 86–87, 657 (1996).CrossRefGoogle Scholar
Skogsmo, J., Halvarsson, M., and Vuorinen, S., Surf. Coat. Technol. 54/55, 186 (1992).Google Scholar
Thornton, J.A. and Chin, J., Ceramic Bull. 56, 504 (1977).Google Scholar
Quade, A. and Wulff, H., Thin Solid Films 355–356, 494 (1999).CrossRefGoogle Scholar
Lin, S.S., Huang, J.L., and Li, D.F. (2003, unpublished).Google Scholar
Sun, X.W., Wang, L.D., and Kwok, H.S., Thin Solid Films 360, 75 (2000).CrossRefGoogle Scholar
Kim, Y.J. and Kim, H.J., Mater. Lett. 41, 159 (1999).CrossRefGoogle Scholar
Ohring, M., The Materials Science of Thin Film (Academic Press, San Diego, CA, 1991), p. 441.Google Scholar
Ohya, Y., Saiki, H., Tanaka, T., and Takahashi, Y., J. Am. Ceram. Soc. 79, 825 (1996).CrossRefGoogle Scholar
Komatsu, W., Miyamoto, M., Hujita, S., and Moriyoshi, Y., Yogyo Kyokaishi 76, 407 (1968).CrossRefGoogle Scholar
JCPDS 88-0107 (Joint Committee for Powder Diffraction, Swarthmore, PA, 1999).Google Scholar
Ohring, M., The Materials Science of Thin Films (Academic Press, San Diego, CA, 1991), pp. 314 –316.Google Scholar
Thompson, C.V., in Evolution of Surface and Thin-Film Microstructure, edited by Atwater, H.A., Chason, E.H., Grabow, M.K., and Lagally, M.G. (Mater. Res. Soc. Symp. Proc. 280, Pittsburgh, PA, 1992), p. 307.Google Scholar
Thompson, C.V., in Polycrystalline Thin Films: Structure, Texture, Properties and Applications, edited by Barmak, K., Parker, M.A., Floro, J.A., Sinclair, R., and Smith, D.A. (Mater. Res. Soc. Symp. Proc. 343, Pittsburgh, PA, 1994), p. 307.Google Scholar
Prasad, S.V., Walck, S.D., and Zabinski, J.S., Thin Solid Films 360, 107 (2000).CrossRefGoogle Scholar
Kwok, H.S., Sun, X.W., and Kim, D.H., Thin Solid Films 335, 299 (1998).CrossRefGoogle Scholar
Drift, A. van der, Philips Res. Rep. 22, 267 (1967).Google Scholar
Knuyt, G., Quaeyhaegens, C., D’Haen, J., and Stals, L.M., Thin Solid Films 258, 159 (1995).CrossRefGoogle Scholar
Knuyt, G., Quaeyhaegens, C., D’Haen, J., and Stals, L.M., Phys. Status Solidi B 195, 179 (1996).CrossRefGoogle Scholar
Barna, P.B. and Adamik, M., Thin Solid Films 317, 27 (1998).CrossRefGoogle Scholar
Lohmann, R., sterschulze, E. O¨, Thoma, K., Ga¨rtner, H., Herr, W., Matthes, B., Broszeit, E., and Kloos, K-H., Mater. Sci. Eng. A 139, 259 (1991).CrossRefGoogle Scholar
Cullity, B.D., Elements of X-ray Diffraction, 2nd ed. (Addison-Wesley, Boston, MA, 1978), pp. 8687.Google Scholar
Christian, J.W., The Theory of Transformation in Metals and Alloys, 2nd ed., Part 1 (Pergamon Press, Oxford, U.K., 1975), p. 418.Google Scholar
Paraguay, D.F., Estrada, L.W., Acosta, N.D.R., Andrade, E., Miki-Yoshida, M., Thin Solid Films 350, 192 (1999).CrossRefGoogle Scholar
Salehi, A., Thin Solid Films 324, 214 (1998).CrossRefGoogle Scholar
Bender, M., Seelig, W., Daube, C., Frankenberger, H., Ocker, B., and Stollenwerk, J., Thin Solid Films 326, 72 (1998).CrossRefGoogle Scholar