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Enhanced Nucleation and Decreased Growth Rates of Cu2O in Cu0.5Au0.5 (001) Thin Films During in situ Oxidation

Published online by Cambridge University Press:  01 July 2005

Liang Wang*
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261
Judith C. Yang
Affiliation:
Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261
*
a) Address all correspondence to this author.e-mail: [email protected]
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Abstract

The initial oxidation behaviors of Cu–50 at.% Au (001) single-crystal thin film were studied by in situ ultra-high-vacuum transmission electron microscopy to model nano-oxidation of alloys with one oxidizing component and one inert component. The oxidation behaviors such as incubation time, oxide nucleation rate, oxide growth kinetics as well as nucleation activation energy were greatly changed by the addition of nonoxidizing Au. The reasons for these changes, such as Au segregation to the top surface, a decrease in Cu activity, and reduced lattice mismatch due to the addition of Au, were discussed, and a qualitative analysis of nucleation energetics was given.

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Articles
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1Padture, N.P., Gell, M. and Jordan, E.H.: Materials science: Thermal-barrier coatings for gas-turbine engine apptications. Science 296, 280 (2002).CrossRefGoogle Scholar
2Evans, A.G., Mumm, D.R., Hutchinson, J.W., Meier, G.H. and Pettit, F.S.: Mechanisms controlling the durability of thermal-barrier coatings. Prog. Mater. Sci. 46, 505 (2001).CrossRefGoogle Scholar
3Aggarwal, S., Monga, A.P., Perusse, S.R., Ramesh, R., Ballarotto, V., Williams, E.D., Chalamala, B.R., Wei, Y. and Reuss, R.H.: Spontaneous ordering of oxide nanostructures. Science 287, 2235 (2000).CrossRefGoogle ScholarPubMed
4Aggarwal, S., Ogale, S.B., Ganpule, C.S., Shinde, S.R., Novikov, V.A., Monga, A.P., Burr, M.R., Ramesh, R., Ballarotto, V. and Williams, E.D.: Oxide nanostructures through self-assembly. Appl. Phys. Lett. 78, 1442 (2001).CrossRefGoogle Scholar
5Over, H., Kim, Y.D., Seitsonen, A.P., Wendt, S., Lundgren, E., Schmid, M., Varga, P., Morgante, A. and Ertl, G.: Atomic-scale structure and catalytic reactivity of the RuO2(110) surface. Science 287, 1474 (2000).CrossRefGoogle Scholar
6Delmon, B. Formation of final catalyst, in Handbook of Heterogeneous Catalysis, edited by Ertl, G., Knozinger, H., and Weitkamp, J. (Wiley-VCH, New York, NY, 1997), p. 264.CrossRefGoogle Scholar
7Marikar, P., Brodsky, M.B., Sowers, C.H. and Zaluzec, N.J.: In situ HVem studies of the early stages of oxidation of nickel and nickel chromium-alloys. Ultramicroscopy 29, 247 (1989).CrossRefGoogle Scholar
8Holloway, P.H. and Hudson, J.B.: Kinetics of the reaction of oxygen with clean nickel single crystal surfaces: II. Ni (111) surface. Surf. Sci. 43, 141 (1974).CrossRefGoogle Scholar
9Shinde, S.R., Ogale, A.S., Ogale, S.B., Aggarwal, S., Novikov, V., Williams, E.D. and Ramesh, R.: Self-organized pattern formation in the oxidation of supported iron thin films. I. An experimental study. Phys. Rev. B 64, 035408 (2001).CrossRefGoogle Scholar
10Thurmer, K., Williams, E. and Reutt-Robey, J.: Autocatalytic oxidation of lead crystallite surfaces. Science 297, 2033 (2002).CrossRefGoogle ScholarPubMed
11Zhou, G.W. Dynamics of copper oxidation investigated by in situ UHV-TEM. Ph.D. Thesis, University of Pittsburgh, Pittsburgh, PA (2003).Google Scholar
12Coulman, D.J., Wintterlin, J., Behm, R.J. and Ertl, G.: Novel mechanism for the formation of chemisorption phases: The (2x1)O-Cu(110) added-row reconstruction. Phys. Rev. Lett. 64, 1761 (1990).CrossRefGoogle Scholar
13Eierdal, L., Besenbacher, F., Laegsgaard, E. and Stensgaard, I.: Interaction of oxygen with Ni(110) studied by scanning-tunneling-microscopy. Surf. Sci. 312, 31 (1994).CrossRefGoogle Scholar
14Carlisle, C.I., Fujimoto, T., Sim, W.S. and King, D.A.: Atomic imaging of the transition between oxygen chemisorption and oxide film growth on Ag{111}. Surf. Sci. 470, 15 (2000).CrossRefGoogle Scholar
15Yang, J.C., Evan, D. and Tropia, L.: From nucleation to coalescence of Cu2O islands during in situ oxidation of Cu(001). Appl. Phys. Lett. 81, 241 (2002).CrossRefGoogle Scholar
16Zhou, G.W. and Yang, J.C.: Formation of quasi-one-dimensional Cu2O structures by in situ oxidation of Cu(100). Phys. Rev. Lett. 89, 106101 (2002).CrossRefGoogle ScholarPubMed
17Yang, J.C., Yeadon, M., Kolasa, B. and Gibson, J.M.: Oxygen surface diffusion in three-dimensional Cu2O growth on Cu(001) thin films. Appl. Phys. Lett. 70, 3522 (1997).CrossRefGoogle Scholar
18Zhou, G.W. and Yang, J.C.: Temperature effect on the Cu2O oxide morphology created by oxidation of Cu(001) as investigated by in situ UHV TEM. Appl. Surf. Sci. 210, 165 (2003).CrossRefGoogle Scholar
19Buck, T.M., Wheatley, G.H. and Marchut, L.: Order-disorder and segregation behavior at the Cu3Au(001) surface. Phys. Rev. Lett. 51, 43 (1983).CrossRefGoogle Scholar
20Reichert, H., Eng, P.J., Dosch, H. and Robinson, I.K.: Thermodynamics of surface segregation profiles at Cu3Au(001) resolved by x-ray-scattering. Phys. Rev. Lett. 74, 2006 (1995).CrossRefGoogle ScholarPubMed
21Mroz, S.: Experimental determination of the composition depth profile of AuCu alloys via Auger electron spectroscopy. Prog. Surf. Sci. 59, 323 (1998).CrossRefGoogle Scholar
22Over, H., Gilarowski, G. and Niehus, H.: The composition and structure of Cu3Au(110)-(4x1): A low-energy electron diffraction analysis. Surf. Sci. 381, L619 (1997).CrossRefGoogle Scholar
23Tersoff, J.: Oscillatory segregation at a metal alloy surface: Relation to ordered bulk phases. Phys. Rev. B 42, 10965 (1990).CrossRefGoogle Scholar
24Mcdonald, M.L., Gibson, J.M. and Unterwald, F.C.: Design of an ultrahigh-vacuum specimen environment for high-resolution transmission electron-microscopy. Rev. Sci. Instrum. 60, 700 (1989).CrossRefGoogle Scholar
25Polak, M. and Rubinovich, L.: The interplay of surface segregation and atomic order in alloys. Surf. Sci. Rep. 38, 129 (2000).CrossRefGoogle Scholar
26Bardi, U.: The atomic-structure of alloy surfaces and surface alloys. Rep. Prog. Phys. 57, 939 (1994).CrossRefGoogle Scholar
27Robinson, I.K. and Eng, P.J.: Near-surface and bulk short-range order in Cu3Au. Phys. Rev. B 52, 9955 (1995).CrossRefGoogle ScholarPubMed
28Graham, G.W.: Oxygen-adsorption on Cu3Au(100) above 350-K. Surf. Sci. 137, L79 (1984).CrossRefGoogle Scholar
29Niehus, H. and Achete, C.: Surface-structure investigation of nitrogen and oxygen on Cu3Au(100). Surf. Sci. 289, 19 (1993).CrossRefGoogle Scholar
30Nakanishi, S., Kawamoto, K., Fukuoka, N. and Umezawa, K.: Low-energy ion-scattering analysis of the surface compositional change of Au3Cu(001) induced by oxygen-chemisorption. Surf. Sci. 261, 342 (1992).CrossRefGoogle Scholar
31Zhou, G.W. and Yang, J.C.: Department of Materials Science and Engineering, University of Pittsburgh, Pittsburgh, PA (unpublished).Google Scholar
32Yang, J.C., Yeadon, M., Kolasa, B. and Gibson, J.M.: The homogeneous nucleation mechanism of Cu2O on Cu(001). Scripta Mater. 38, 1237 (1998).CrossRefGoogle Scholar
33Ohring, M.: The Materials Science of Thin Films, 2nd ed. (Academic Press, San Diego, CA, 2001,) p. 380.Google Scholar
34Zhou, G.W. and Yang, J.C.: Initial oxidation kinetics of copper (110) film investigated by in situ UHV-TEM. Surf. Sci. 531, 359 (2003).CrossRefGoogle Scholar
35Zhou, G.W. and Yang, J.C.: Temperature effects on the growth of oxide islands on Cu(110). Appl. Surf. Sci. 222, 357 (2004).CrossRefGoogle Scholar
36Jeurgens, L.P.H., Sloof, W.G., Tichelaar, F.D. and Mittemeijer, E.J.: Thermodynamic stability of amorphous oxide films on metals: Application to aluminum oxide films on aluminum substrates. Phys. Rev. B 62, 4707 (2000).CrossRefGoogle Scholar