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TXRF High Sensitivity X-Ray Analyzer With Multi-Layer Monochromator
Published online by Cambridge University Press: 06 March 2019
Extract
Total reflection X-ray Fluorescence (TXRF) has been applied to the detection and quantification of metal contamination on the surface and near-surface regions of silicon wafers in the semiconductor industry The need for improving the sensitivity and detection limit of the TXRF technique is driven by the progress in producing thinner films and finer features in the development of larger Mbit DRAMS.
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- Copyright © International Centre for Diffraction Data 1993
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