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Mechanism of the Slow-Down of the Silicon Etch Rate by a Fluorocarbon Overlayer in CF4/H2 Reactive Ion Etching of Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 98 / 1987
- Published online by Cambridge University Press:
- 25 February 2011, 229
- Print publication:
- 1987
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- Article
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