3 results
Fluorinated Gate Oxide Films Utilized in Polysilicon Thin Film Transistors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 437
- Print publication:
- 1992
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Plasma Etching of Tungsten Silicide Structures Using NF3-Halocarbon Etchants
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- Journal:
- MRS Online Proceedings Library Archive / Volume 190 / 1990
- Published online by Cambridge University Press:
- 21 February 2011, 291
- Print publication:
- 1990
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- Article
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Nitridation Induced-Reactions in Si and SiO2
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- Journal:
- MRS Online Proceedings Library Archive / Volume 59 / 1985
- Published online by Cambridge University Press:
- 28 February 2011, 561
- Print publication:
- 1985
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- Article
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