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S22 Invited—Diffraction Analysis of Stress Gradients in Tin Thin Films: An Explanation for the Occurrence of Whisker Formation?

Published online by Cambridge University Press:  20 May 2016

M. Sobiech ,
U. Welzel ,
E. J. Mittemeijer ,
W. Hügel  and
A. Seekamp
M. Sobiech
Affiliation:
Max Planck Institute for Metals Research, Stuttgart, Germany
U. Welzel
Affiliation:
Max Planck Institute for Metals Research, Stuttgart, Germany
E. J. Mittemeijer
Affiliation:
Max Planck Institute for Metals Research, Stuttgart, Germany
W. Hügel
Affiliation:
Robert-Bosch GmbH, Reutlingen, Germany
A. Seekamp
Affiliation:
Robert-Bosch GmbH, Reutlingen, Germany
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Abstract

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Type
DENVER X-RAY CONFERENCE
Information
Powder Diffraction , Volume 23 , Issue 2 , June 2008 , pp. 185
Copyright
Copyright © Cambridge University Press 2008

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