Hostname: page-component-586b7cd67f-rdxmf Total loading time: 0 Render date: 2024-11-29T06:58:03.209Z Has data issue: false hasContentIssue false
  • English
  • Français

Annealing and Persistent Photoconductivity Effects in Amorphous and Crystalline Vanadium Oxide Films

Published online by Cambridge University Press:  01 February 2011

Jason Kekas ,
Anuj Dhawan ,
Praveen Gollakota  and
John Muth
Jason Kekas
Affiliation:
[email protected], NCSU, ECE, 7202 Doverton Court, Raleigh, NC, 27615, United States, (919) 513-4460
Anuj Dhawan
Affiliation:
[email protected], NC State University, Electrical & Computer Engineering, Raleigh, NC, 27695, United States
Praveen Gollakota
Affiliation:
[email protected], NC State University, Electrical & Computer Engineering, Raleigh, NC, 27695, United States
John Muth
Affiliation:
[email protected], NC State University, Electrical & Computer Engineering, Raleigh, NC, 27695, United States
Get access

Abstract

Vanadium dioxide films have long attracted attention because of the phase transition between the semiconducting state and the metallic state at 68 degrees centigrade. Vanadium oxide films have been prepared by a variety of methods, including the annealing and oxidation of evaporated vanadium under controlled conditions. In this study we explore a different route by producing amorphous and crystalline VOx films by pulsed laser deposition and annealing under a variety of conditions. We found that that in amorphous films grown at lower temperatures and then annealed, persistent photoconductivity effects can be observed, while in epitaxial crystalline films grown at high temperature, persistent effects were not observed. Furthermore, it was found that for some crystalline films persistent optical effects were observed and that optical hysteresis was dependent on the amount of time after the film anneal.

Keywords

photoconductivityannealingcrystalline
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 928: Symposium GG – Current and Future Trends of Functional Oxide Films , 2006 , 0928-GG15-05
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Katzke, H., Tole'dano, P., Depmeier, W., Physical Review B, 68, 024109, 2003.Google Scholar
2. Wang, X.J., Li, H.D., Fei, Y.J., Wang, X., Xiong, Y.Y., Nie, Y.X., Feng, K.A., Applied Surface Science, 177, 8, 2001.Google Scholar
3. Zhang, Y.P., O'Connor, C.J., Clearfield, A., Haushalter, R.C., Chemistry of Materials, 8, 595, 1996.Google Scholar
4. Partlow, D.P., Gurkovich, S.R., Radford, K.C., Denes, L.J., Journal of Applied Physics, 70 (1), 443, 1991.Google Scholar
5. Lopez, R., Boatner, L.A., and Haynes, T.E., Feldman, L.C., Haglund, R.F., Jr., Applied Physics Letters, 92 (7), 4031, 2002.Google Scholar
6. Kim, D.H. and Kwok, H.S., Applied Physics Letters, 65 (25), 3188, 1994.Google Scholar