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Hydroxyapatite Coating on Thermal Titanium Substrate in Aqueous Solution

Published online by Cambridge University Press:  10 February 2011

M. Okido
Affiliation:
CIRSE, Nagoya University, Nagoya 464–803, JAPAN, [email protected]
R. Ichino
Affiliation:
Dept. of Mater. Sci. and Eng., Nagoya University
K. Kuroda
Affiliation:
CIRSE, Nagoya University, Nagoya 464–803, JAPAN, [email protected]
R. Ohsawa
Affiliation:
Dept. of Mater. Sci. and Eng., Nagoya University
O. Takai
Affiliation:
Dept. of Mater. Proc. Eng., Nagoya University
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Abstract

A hydroxyapatite, HAP, film was deposited on a titanium substrate in an aqueous solution, at an ambient temperature and ambient pressure. The solution included 3 mmoldm-3 Ca(H2PO4)2 and 7 mmol dm-3 CaCl2 at pH 5.5. The temperature of the substrate surface was controlled in both methods of applying alternative current through the Ti foil and high frequency induction heating using Ti ingot. In these methods, the substrate was heated up and the temperature gradient was formed between the substrate and the solution. The effects of surface temperature, fluoride ions, additive inhibitor and heating time on the morphology of HAP crystals formed on Ti substrate were investigated in various conditions. The morphology changed from compact layer to dendrite layer with the HAP growing time in AC current method and the HAP film with the thickness of 200 μm can be obtained on Ti foil with cross section of 30 μm × 2mm by heating for 20 min at 20 A-AC. On the other hand, the deposits consisted of algae-like whisker in the induction heating method. The HAP formation is found to take place only on the substrate surface by these substrate heating methods without HAP precipitation in aqueous solution

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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