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Improving the Resolution of Sputter-coated Films
Published online by Cambridge University Press: 14 March 2018
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After an inquiry from the Microscopy Listserver, I went back to my 1980 copy of Scanning Electron Microscopy, volume I. Several authors had investigated the structure of thin metal films by depositing the films onto carbon-film-covered TEM grids and imaging the films at high magnification. There were several proposals for new devices that have since become standards for high-resolution coaters, but the Listserver inquiry was for a fine conducting film suitabie for high-resolution SEM from an existing sputter coater.There were several factors studied that influenced the fine structure of the films. The first was the materials sputtered: for a given set of conditions of voltage, current and time, platinum gave the finest film, 60% gold-40% palladium (Au/Pd) the next finest and pure gold the least fine.
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- Copyright © Microscopy Society of America 2000
References
1. Peters, K. R. 1980. Penning Sputtering of Thin Metal Films for High Resolution Electron microscopy, SEM/1980/l, SEM Inc., AMF O'Hare, IL. 143-154.Google Scholar
2. Franks, J., Clay, C. S., Pease, G. W. 1980. Ion Beam Thin Film Deposition. SEM/1980/l, SEM Inc., AMF O'Hare, IL. 155-162.Google Scholar
3. Echlin, P., Broers, A. N., Gee, W. 1980 Improved Resolution of Sputter- coated Metal Films. SEM/1980/l, SEM Inc., AMF O'Hare, IL. 163-170.Google Scholar
4. Slayter, H. S. 1980. High Resolution Metal Coating of Biopolymers. SEM/1980/l, SEM Inc., AMF O'Hare, IL. 171-182.Google Scholar
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