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A Study of Gallium FIB induced Silicon Amorphization using TEM, APT and BCA Simulation

Published online by Cambridge University Press:  23 September 2015

Jin Huang ,
Markus Loeffler ,
Uwe Muehle ,
Wolfhard Moeller ,
Hans Mulders ,
Laurens Kwakman  and
Ehrenfried Zschech
Jin Huang
Affiliation:
.Dresden Center for Nanoanalysis, Technische Universitaet Dresden, Dresden, Germany.
Markus Loeffler
Affiliation:
.Dresden Center for Nanoanalysis, Technische Universitaet Dresden, Dresden, Germany.
Uwe Muehle
Affiliation:
.Fraunhofer Institute for Ceramic Technologies and Systems, Dresden, Germany.
Wolfhard Moeller
Affiliation:
.Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany.
Hans Mulders
Affiliation:
.FEI Company, Eindhoven, the Netherlands.
Laurens Kwakman
Affiliation:
.FEI Company, Eindhoven, the Netherlands.
Ehrenfried Zschech
Affiliation:
.Dresden Center for Nanoanalysis, Technische Universitaet Dresden, Dresden, Germany. .Fraunhofer Institute for Ceramic Technologies and Systems, Dresden, Germany.

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1839 - 1840
Copyright
Copyright © Microscopy Society of America 2015 

References

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[7] The authors acknowledge the project funding from FEI and Makizu project funding from BMBF.Google Scholar