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A Study of Amorphous Chalcogenides by Electron Microscopy and Analysis

Published online by Cambridge University Press:  02 July 2020

A. G. Fitzgerald  and
K. Mietzsch
A. G. Fitzgerald
Affiliation:
Department of Applied Physics and Electronic & Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, UK
K. Mietzsch
Affiliation:
Department of Applied Physics and Electronic & Mechanical Engineering, University of Dundee, Dundee, DDI 4HN, UK
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Extract

Amorphous chalcogenides films coated with certain metals are known to possess a remarkable sensitivity to radiation. Based on these effects they have found several important applications in the production of microcircuits, e.g. as resists in photo- and electron beam lithography. A variety of chalcogenides in combination with a range of metals has been extensively investigated with regard to potential applications in the fabrication of semiconductor devices.

The objectives of the present project are to extend knowledge of the behaviour of amorphous chalcogenides in contact with metals. This includes studying the metal diffusion process, understanding the film-electron beam interaction process and evaluating the potential of the metal lines formed by the electron beam in fabrication of photomasks for the production of higher densities of silicon microcircuits.

Type
Nanophase and Amorphous Materials
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 714 - 715
Copyright
Copyright © Microscopy Society of America

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