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Proactive Control of the Growth Behavior of a Thermally Grown Oxide by a Chemically Vapor Deposited Al2O3 Layer

Published online by Cambridge University Press:  21 July 2003

Y.-F. Su ,
L.F. Allard ,
D.W. Coffey  and
W.Y. Lee
Y.-F. Su
Affiliation:
Department of Chemical, Biochemical, and Materials Engineering, Stevens Institute of Technology, Hoboken, NJ 0707
L.F. Allard
Affiliation:
High Temperature Materials Lab., Oak Ridge National Laboratory, Oak Ridge, TN 3783
D.W. Coffey
Affiliation:
High Temperature Materials Lab., Oak Ridge National Laboratory, Oak Ridge, TN 3783
W.Y. Lee
Affiliation:
Department of Chemical, Biochemical, and Materials Engineering, Stevens Institute of Technology, Hoboken, NJ 0707

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 678 - 679
Copyright
Copyright © Microscopy Society of America 2003