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Methodology for Studying Nanoscale Details of Focused Ion Beam Gas-Assisted Etching and Deposition by TEM and Numerical Modeling

Published online by Cambridge University Press:  23 September 2015

Valery Ray ,
Eddie Chang ,
Kevin Toula ,
Sz-Chian Liou  and
Wen-An Chiou
Valery Ray
Affiliation:
.PBS&T, MEO Engineering Co., Inc. Methuen, MA 01844, USA
Eddie Chang
Affiliation:
.Department of Physics, University of Maryland, College Park, MD 20742, USA
Kevin Toula
Affiliation:
.Department of Material Science and Engineering, University of Maryland, College Park, MD USA
Sz-Chian Liou
Affiliation:
NISP Lab, NanoCenter, University of Maryland, College Park, MD 20742, USA
Wen-An Chiou
Affiliation:
NISP Lab, NanoCenter, University of Maryland, College Park, MD 20742, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1843 - 1844
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Ivo Utke, , et al, JVST B 26(4 (2008). p 1197.Google Scholar
[2] Shida Tan, , et al, JVST B 30(6 (2012). p 06F606.Google Scholar
[3] Research was partially supported by NSF-MRSEC (DMR 05-20471) and UMD. Oleg Sidorov of FEI contributed with outstanding execution of single-line etching and deposition design of experiment..Google Scholar