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Gas-Mediated Electron Beam Induced Etching - From Fundamental Physics to Device Fabrication

Published online by Cambridge University Press:  27 August 2014

A. A. Martin ,
I. Aharonovich  and
M. Toth
A. A. Martin
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia
I. Aharonovich
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia
M. Toth
Affiliation:
School of Physics and Advanced Materials, University of Technology, Sydney, Australia

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 364 - 365
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] “Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications”, ed. I. Utke, S. Moshkalev, and P. Russell, (Oxford University Press, New York).Google Scholar
[2] Martin, A. A., Phillips, M., Toth, M. ACS Appl. Mater. Interfaces 5 (2013), p. 8002-8007.Google Scholar
[3] Lobo, C. J., Martin, A. A., Phillips, M. R., Toth, M. Nanotechnology 23 (2012), p. 375302.Google Scholar
[4] Acknowledgments: This work was partly funded by FEI Company. A. Martin is the recipient of a John Stocker Postgraduate Scholarship from the Science and Industry Endowment Fund. I. Aharonovich is the recipient of an Australian Research Council Discovery Early Career Research Award (Project Number DE130100592).Google Scholar