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Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

Published online by Cambridge University Press:  27 August 2014

S.K. Nandi ,
D. J. Llewellyn ,
K. Belay ,
D.K. Venkatachalam ,
X. Liu  and
R.G. Elliman
S.K. Nandi
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia Research School of Astronomy and Astrophysics, The Australian National University, ACT-0200, Australia Department of Physics, The University of Chittagong, Chittagong-4331, Bangladesh
D. J. Llewellyn
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia Centre for Advanced Microscopy, The Australian National University, ACT-0200, Australia
K. Belay
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia
D.K. Venkatachalam
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia
X. Liu
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia
R.G. Elliman
Affiliation:
Department of Electronic Materials Engineering, Research School of Physics and Engineering, The Australian National University, ACT-0200, Australia

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 1984 - 1985
Copyright
Copyright © Microscopy Society of America 2014 

References

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[3] Yew, K., Ang, D. and Bersuker, G. IEEE electron device letters 33 (2) (2012), p.146.Google Scholar