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Characterization of Ultra-Thin Hf-based Alternative Dielectric Layers for Si CMOS by Z-contrast Imaging and Electron Energy-Loss Spectroscopy in STEM
Published online by Cambridge University Press: 01 August 2004
Extract
Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.
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- Research Article
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- © 2004 Microscopy Society of America