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First Observation of InxGa1−xAs Quantum Dots in GaP by Spherical-Aberration-Corrected HRTEM in Comparison with ADF-STEM and Conventional HRTEM

Published online by Cambridge University Press:  22 January 2004

Nobuo Tanaka
Affiliation:
Center of Integrated Research in Science and Technology, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, 464-8603, Japan
Jun Yamasaki
Affiliation:
Center of Integrated Research in Science and Technology, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, 464-8603, Japan
Shingo Fuchi
Affiliation:
Department of Materials Science and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, 464-8603, Japan
Yoshikazu Takeda
Affiliation:
Department of Materials Science and Engineering, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya, 464-8603, Japan
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Abstract

InxGa1−xAs quantum dots in GaP(100) crystals prepared by the OMVPE technique are observed along the [011] direction with a newly developed 200-kV spherical aberration(Cs)-corrected HRTEM, a 200-kV annular dark-field (ADF)-STEM, and a 200-kV conventional HRTEM equipped with a thermal field-emission gun. The dots are 6–10 nm in size and strongly strained due to the misfit of about 9% with the GaP substrate and GaP cap layer. All of the cross-sectional high-resolution electron micrographs show dumbbell images of Ga and P atomic columns separated by 0.136 nm in well-oriented and perfect GaP areas, but the interpretable images are limited to those taken with the Cs-corrected HRTEM and ADF-STEM with Fourier filtering of the images. The Cs-corrected HRTEM and ADF-STEM are comparable from the viewpoint of interpretable resolution. A detailed comparison between the Cs-corrected HRTEM images and the simulated ones with electron incidence tilted by 1° to 5° from the [011] zone axis gives information on local lattice bending in the dots from the images around 0.1 nm resolution. This becomes one of the useful techniques newly available from electron microscopy with sub-Ångstrom resolution.

Type
Research Article
Copyright
© 2004 Microscopy Society of America

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References

REFERENCES

Fuchi, S., Nonogaki, Y., Iguchi, T., Moriya, H., Fujiwara, Y., & Takeda, Y. (2000). Effects of GaP cap layer growth on self-assembled InAs islands grown on GaP(001) by organometallic vapor phase epitaxy. Jpn J Appl Phys 39, 32903293.Google Scholar
Haider, M., Rose, H., Uhlemann, S., Kabius, B., & Urban, K. (1998). Towards 0.1 nm resolution with the first spherically corrected transmission electron microscope. J Electron Microsc 47, 395405.Google Scholar
Honjo, G. & Yagi, K. (1980). Studies of epitaxial growth of thin films in-situ electron microscopy. In Current Topics in Materials Science, Kaldis, E. (Ed.), pp. 197304. Amsterdam: North-Holland.
Hosokawa, F., Tomita, T., Honda, T., Hartel, P., & Haider, M. (2003). A spherical aberration-corrected 200 kV TEM. J Electron Microsc 52, 310.CrossRefGoogle Scholar
Hu, J.J. & Tanaka, N. (1998). An approximate multi-beam form of the ellipse in high-resolution transmission electron microscopy. Ultramicroscopy 74, 105111.Google Scholar
Ishizuka, K. (1982). Multislice formula for inclined illumination. Acta Cryst A 38, 773779.Google Scholar
Jia, C.L., Lentzen, M., & Urban, K. (2003). Atomic-resolution imaging of oxygen in perovskite ceramics. Science 299, 870872.CrossRefGoogle Scholar
Jin-Phillipp, N.Y. & Phillipp, F. (1998). Defect formation in self-assembling quantum dots of InGaAs on GaAs; a case study of direct measurements of local strain from HREM. J Microsc 194, 161170.Google Scholar
Krivanek, O.L., Dellby, N., & Lupini, A.R. (1999). Toward sub-Å electron beams. Ultramicroscopy 78, 111.CrossRefGoogle Scholar
Lentzen, M., Jahnen, B., Jia, C.L., Thust, A., Tillman, K., & Urban, K. (2002). High-resolution images with an aberration-corrected transmission electron microscope. Ultramicroscopy 92, 233242.Google Scholar
Nellist, P.D. & Pennycook, S.J. (1999). Incoherent imaging using dynamically scattered coherent electrons. Ultramicroscopy 78, 111124.CrossRefGoogle Scholar
Nonogaki, Y., Iguchi, T., Fuchi, S., Fujiwara, Y., & Takeda, Y. (1998). Nanometer-scale islands grown on GaP(001) by organometallic vapor-phase epitaxy. Appl Surf Sci 130/131, 724728.CrossRefGoogle Scholar
Ourmazd, A., Taylor, D.W., Bode, M., & Kim, Y. (1989). Quantifying the information content of lattice images. Science 246, 15711577.CrossRefGoogle Scholar
Reimer, L. (1984). Transmission Electron Microscopy. Berlin: Springer.CrossRef
Tanaka, N., Hirayama, T., Ikuhara, Y., Hosokawa, F. and Naruse, M. (2002). Direct observation of nano-particles and interfaces by Cs-corrected TEM, Proceedings of the ICEM-15, Cross, R. (Ed.), Vol. 1, pp. 3738. Onderstepoort, South Africa: Microscopy Society of South Africa.
Tanaka, N., Hu, J.J., Yamasaki, J., Murooka, Y., Zaima, S., & Yasuda, Y. (2001a). Interface reactions in TiSi1−xGex/Si(100) studied by TEM and ADF imaging on a newly installed 200 kV TEM/STEM. Inst Phys Conf Ser 168, 373376.Google Scholar
Tanaka, N. & Kawahara, M. (2001b). Time-resolved high-resolution transmission electron microscopy and high-angle annular dark field scanning transmission electron microscopy of metal-mediated crystallization of amorphous germanium. Mater Sci Eng A 312, 2530.Google Scholar
Tanaka, N., Suzuki, N., Kawasaki, M., Hata, S., Kuwano, N., & Oki, K. (2000). High-angle annular dark field STEM of partially ordered Ni-19.5at%Mo alloys. J Physique IV 10, 8590.Google Scholar
Tanaka, N., Yamasaki, J., Usuda, K., & Ikarashi, N. (2003). First observation of Si′O2/Si′ (100) interfaces by spherical aberration-corrected high-resolution transmission electron microscopy. J Electron Microsc 52, 6973.CrossRefGoogle Scholar
Tillmann, K., Thust, A., Lentzen, M., Swiatek, P., Foerster, A., Urban, K., Laufs, W., Gerthsen, D., Remmle, T., & Rosenauer, A. (1996). Determination of segregation, elastic strain and thin-foil relaxation in InxGa1−xAs islands on GaAs(001) by high-resolution transmission electron microscopy. Phil Mag 74, 309315.Google Scholar
Yamasaki, T., Kawasaki, M., Watanabe, K., Hashimoto, I., & Shiojiri, M. (2001). Artificial bright spots in atomic-resolution high-angle annular dark field STEM images. J Electron Microsc 50, 517521.CrossRefGoogle Scholar
Zemlin, F., Weiss, K., Schiske, P., Kunath, W., & Herrmann, K.H. (1977). Coma-free alignment of high-resolution electron microscopes with the aid of optical diffractograms. Ultramicroscopy 3, 4960.Google Scholar
Zhang, X.-F. & Zhang, Z. (Eds.). (2001). Progress in Transmission Electron Microscopy. Berlin: Springer.