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3d Reconstruction of Sub-Nm Beam Profiles in STEM

Published online by Cambridge University Press:  02 July 2020

G. Möbus ,
R.E. Dunin-Borkowski ,
C.J.D. Hethėrington  and
J.L. Hutchison
G. Möbus
Affiliation:
Department of Materials, Oxford University, OxfordOX1 3PH, UK
R.E. Dunin-Borkowski
Affiliation:
Department of Materials, Oxford University, OxfordOX1 3PH, UK
C.J.D. Hethėrington
Affiliation:
Department of Materials, Oxford University, OxfordOX1 3PH, UK
J.L. Hutchison
Affiliation:
Department of Materials, Oxford University, OxfordOX1 3PH, UK
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Abstract

Introduction:Atomically resolved chemical analysis using techniques such as electron energy loss spectroscopy and annular dark field imaging relies on the ability to form a well-characterised sub-nm electron beam in a FEGTEM/STEM [1-2]. to understand EELS+EDX-signal formation upon propagation of a sub-nm beam through materials we first have to assess precisely the beam intensity distribution in vacuum and find conditions for the best obtainable resolution.

Experimental Details:Modern TEM/STEM instruments combine features of both imaging and scanning technology. The beam forming capability approaches closely that for dedicated STEMs, while CCD recording devices allow us to measure the beam profile by direct imaging at magnifications up to 1.5 M. The recording of a “z-section” series through the 3D intensity distribution of the cross-over can therefore be realised by recording of a “condenser focal series”.

Type
Atom Location by Channeling Enhancement of X-Ray and EELS Signals (ALCHEMI)(organized by J.Spence)
Information
Microscopy and Microanalysis , Volume 7 , Issue S2: Proceedings: Microscopy & Microanalysis 2001, Microscopy Society of America 59th Annual Meeting, Microbeam Analysis Society 35th Annual Meeting, Long Beach, California August 5-9, 2001 , August 2001 , pp. 344 - 345
Copyright
Copyright © Microscopy Society of America 2001

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References

1.Hutchison, J.L. et al, JEOL News, 34E, No. (1999), 10–15.Google Scholar
2.Hutchison, J.L et al., J. Electr. Microsc, in preparation.Google Scholar
3.Kirkland, E.J., Advanced Computing in Electron Microscopy, Plenum, N.Y., USA (1998).CrossRefGoogle Scholar
4.Stadelmann, P., Ultramicroscopy, 21 (1987), 131.CrossRefGoogle Scholar
5.Möbus, G., Proceed. EUREM 12, Frank, L., Ciampor, F. eds, Brno, Vol I, 385 (2000).Google Scholar
6.Spence, J.C.H. and Tafto, J., J. Microscopy, 130, (1983). 147.CrossRefGoogle Scholar
7.Möbus, G. and Nufer, S., this volume.Google Scholar
8. Funding by EPSRC for the FEGTEM (GR/L22324) and an Advanced Fellowship (G.M.) is gratefully acknowledged. We thank H.Banzhof & M. Lehmann for providing their LI2 subroutine for EMS.Google Scholar